Physical and Chemical Processes in Gas-Discharge Plasma During the Deposition of Nanocarbon Films

R. R. Ismagilov, A. P. Volkov, P. V. Shvets, and A. N. Obraztsov

Department of Physics, Moscow State University, Moscow, 119991 Russia

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Received March 13, 2003

Abstract — The relationship of the parameters of activated methane–hydrogen mixture with the phase composition and structural features was determined for carbon films, which were precipitated from this mixture. Optical emission spectra of dc discharge were studied in conditions of the growth of different nanocarbon films. The peculiarities of the space intensity distribution of radiation corresponding to carbon ₂ dimers are shown.