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Modification of Titanium Surface during Its Chemical Etching in Fluoride-containing Media |
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09.09.2008 г. |
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Modification of Titanium Surface during Its Chemical Etching in Fluoride-containing Media M. G. Dontsov, A. V. Balmasov, A. A. Balukova, and O. I. Nevskii Ivanovo State University of Chemical Technology, pr. F. Engel’sa 7, Ivanovo, 153000 Russia;
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Received May 14, 2006 Abstract — The effects of solution composition on the electrical and other physical properties of surface films formed during the titanium chemical etching in fluoride-containing media are studied. It is shown that the for-mation of resistive oxide films results in the surface leveling and an increase in its reflectivity. PACS numbers: 81.40.–z DOI: 10.1134/S0033173207030149
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